Method for manufacturing a micromechanical system
US9376314B2 · kind B2 · utility
1Cited by
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21Claims
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Key dates
| Filing date | Jun 26, 2014 |
| Grant date | Jun 28, 2016 |
| Priority date | — |
| Expiry date | Jun 26, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01D5/145
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for manufacturing a micromechanical system includes forming in a Front-End-of-Line (FEOL) process transistors in a transistor region; after the FEOL-process, forming a sacrificial layer; structuring the sacrificial layer to form a structured sacrificial layer; forming a functional layer at least partially covering the structured sacrificial layer; and removing the sacrificial layer to create a cavity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.