Patent · US Active

Method for manufacturing a micromechanical system

US9376314B2 · kind B2 · utility

1Cited by
0References
21Claims
0Family size

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Key dates

Filing dateJun 26, 2014
Grant dateJun 28, 2016
Priority date
Expiry dateJun 26, 2034

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01D5/145
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method for manufacturing a micromechanical system includes forming in a Front-End-of-Line (FEOL) process transistors in a transistor region; after the FEOL-process, forming a sacrificial layer; structuring the sacrificial layer to form a structured sacrificial layer; forming a functional layer at least partially covering the structured sacrificial layer; and removing the sacrificial layer to create a cavity.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.