Electric/magnetic field guided acid diffusion
US9377692B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 10, 2014 |
| Grant date | Jun 28, 2016 |
| Priority date | — |
| Expiry date | Jun 10, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/26
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods and apparatuses for minimizing line edge/width roughness in lines formed by photolithography are provided. The random diffusion of acid generated by a photoacid generator during a lithography process contributes to line edge/width roughness. Methods disclosed herein apply an electric field and/or a magnetic field during photolithography processes. The field application controls the diffusion of the acids generated by the photoacid generator along the line and spacing direction, preventing the line edge/width roughness that results from random diffusion. Apparatuses for carrying out the aforementioned methods are also disclosed herein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.