Lithographic apparatus and method
US9383195B2 · kind B2 · utility
0Cited by
8References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 3, 2008 |
| Grant date | Jul 5, 2016 |
| Priority date | — |
| Expiry date | Apr 20, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/95676
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including directing a beam of radiation at the surface of the flexible substrate; and detecting changes in intensity distribution, or angle of reflection, of the beam of radiation after the beam of radiation has been reflected from the surface of the substrate to obtain information indicative of the topography of the surface of the flexible substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.