Patent · US Active

Chamber coatings

US9384950B2 · kind B2 · utility

3Cited by

5References

17Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Ren-Guan Duan · Fremont, US
Juan Carlos Rocha-Alvarez · Redwood City, US
Jianhua Zhou · Campbell, US
Ningli Liu · Cupertino, US
Yihong Chen · San Jose, US
Abhijit Basu Mallick · Palo Alto, US
Sudhir Gondhalekar · Pleasanton, US

Key dates

Filing date	Jan 21, 2015
Grant date	Jul 5, 2016
Priority date	—
Expiry date	Jan 21, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/32467
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

In one embodiment, a processing chamber is disclosed wherein at least one surface of the processing chamber has a coating comprising SivYwMgxAlyOz, wherein v ranges from about 0.0196 to 0.2951, w ranges from about 0.0131 to 0.1569, x ranges from about 0.0164 to 0.0784, y ranges from about 0.0197 to 0.1569, z ranges from about 0.5882 to 0.6557, and v+w+x+y+z=1.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.