Patent · US Active

Magnetic memory and method of manufacturing the same

US9385304B2 · kind B2 · utility

11Cited by
32References
9Claims
0Family size

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Key dates

Filing dateMar 10, 2014
Grant dateJul 5, 2016
Priority date
Expiry dateMar 10, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10N70/20
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

According to one embodiment, a magnetic memory is disclosed. The memory includes a conductive layer containing a first metal material, a stacked body above the conductive layer, and including a first magnetization film containing a second metal material, a second magnetization film, and a tunnel barrier layer between the first magnetization film and the second magnetization film, and an insulating layer on a side face of the stacked body, and containing an oxide of the first metal material. The first magnetization film and/or the second magnetization film includes a first region positioned in a central portion, and a second region positioned in an edge portion and containing As, P, Ge, Ga, Sb, In, N, Ar, He, F, Cl, Br, I, Si, B, C, O, Zr, Tb, S, Se, or Ti.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.