Liquid processing apparatus and cleaning method
US9387520B2 · kind B2 · utility
3Cited by
1References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 15, 2013 |
| Grant date | Jul 12, 2016 |
| Priority date | — |
| Expiry date | Aug 29, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67051
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Disclosed are a liquid processing apparatus and a cleaning method which may perform cleaning on a portion which is not in the vicinity of a drain section in an exhaust route. The liquid processing apparatus includes an exhaust section provided in vicinity of the drain section, which is configured to exhaust a surrounding atmosphere of the substrate held by the substrate holding unit; an exhaust route forming member configured to form an exhaust route reaching the exhaust section; and a first cleaning unit configured to supply a cleaning liquid to the exhaust route forming member at the exhaust route side.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.