Lithography illumination system

US9400433B2 · kind B2 · utility

Assignee

• Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences · CN

Inventors

• Aijun Zeng · Shanghai, CN
• Linglin Zhu · Shanghai, CN
• Ruifang FANG · Shanghai, CN
• Huijie Huang · Shanghai, CN

Key dates

• Filing date: Jun 19, 2015
• Grant date: Jul 26, 2016
• Expiry date: Jun 19, 2035

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70075
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A lithography illumination system, along the transmission direction of the laser light, successively having a laser light source, a collimating and expanding unit, a pupil shaping unit, a first micro-lens array, a micro-integrator rod array, a micro-scanning slit array, a second micro-lens array, a condenser lens group, a mask, and and a motion control unit for controlling the motion of the micro scanning slit array.