Susceptor assemblies for supporting wafers in a reactor apparatus

US9401271B2 · kind B2 · utility

Assignee

• SunEdison Semiconductor Limited (UEN201334164H) · SG

Inventors

• John A. Pitney · Saint Peters, US
• Manabu Hamano · Utsunomiya, JP

Key dates

• Filing date: Mar 15, 2013
• Grant date: Jul 26, 2016
• Expiry date: May 11, 2034

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/68785
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Apparatus and methods for wafer processes such as etching and chemical vapor deposition processes are disclosed. In some embodiments, the apparatus includes a susceptor and a ring disposed beneath the susceptor to influence a thickness of the deposited epitaxial layer.