Apparatus for forming porous silicon layers on at least two surfaces of a plurality of silicon templates
US9401276B2 · kind B2 · utility
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Key dates
| Filing date | Jul 20, 2012 |
| Grant date | Jul 26, 2016 |
| Priority date | — |
| Expiry date | Sep 11, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus for forming porous silicon layers on at least two surfaces of a plurality of silicon templates in a batch electrochemical anodic etch process is provided. The apparatus comprises a plurality of edge-sealing template mounts operable to prevent formation of porous silicon at the edges of a plurality of templates. An electrolyte is disposed among the plurality of templates. The apparatus further comprises a power supply operable to switch polarity, change current intensity, and control etching time to produce the porous silicon layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.