Apparatus and method for optical calibration of wafer placement by a robot

US9405287B1 · kind B1 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Abraham Ravid · Cupertino, US
• Todd Egan · Fremont, US
• Eran Weiss · Ramat Gan, IL
• Michael R. Rice · Pleasanton, US
• Izya Kremerman · Los Gatos, US

Key dates

• Filing date: Jul 22, 2015
• Grant date: Aug 2, 2016
• Expiry date: Jul 22, 2035

Classification

• Technology area (CPC G): Physics
• CPC primary: G05B2219/40572
• WIPO field: Control
• WIPO sector: Instruments

Abstract

An optical calibration method and apparatus for calibration of wafer positioning within a reactor chamber under process conditions employs an array of cameras in a lid of the chamber using images of the wafer edge to locate the wafer relative to the reference feature.