Edge ramping
US9408288B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 24, 2012 |
| Grant date | Aug 2, 2016 |
| Priority date | — |
| Expiry date | Jan 18, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2242/26
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Systems and methods for performing edge ramping are described. A system includes a base RF generator for generating a first RF signal. The first RF signal transitions from one state to another. The transition from one state to another of the first RF signal results in a change in plasma impedance. The system further includes a secondary RF generator for generating a second RF signal. The second RF signal transitions from one state to another to stabilize the change in the plasma impedance. The system includes a controller coupled to the secondary RF generator. The controller is used for providing parameter values to the secondary RF generator to perform edge ramping of the second RF signal when the second RF signal transitions from one state to another.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.