Apparatus for measuring thickness of thin film, system including the apparatus, and method for measuring thickness of thin film
US9417055B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 14, 2015 |
| Grant date | Aug 16, 2016 |
| Priority date | — |
| Expiry date | Jul 14, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/0633
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus and a system for measuring the thickness of a thin film are provided. The apparatus includes a signal detector, a Fast Fourier Transform (FFT) generator, an Inverse Fast Fourier Transform (IFFT) generator, and a thickness analyzer. The signal detector detects an electric field signal with respect to a reflected light that is reflected from a thin film. The FFT generator performs FFT with respect to the electric field signal to separate a DC component from an AC component of the electric field signal. The IFFT generator receives the separated AC component of the electric field signal, performs IFFT with respect to the AC component, and extracts a phase value of the AC component. The thickness analyzer measures the thickness of the thin film using the extracted phase value.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.