Patent · US Active

Gas coupled probe for substrate temperature measurement

US9417138B2 · kind B2 · utility

2Cited by
1References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 10, 2013
Grant dateAug 16, 2016
Priority date
Expiry dateDec 20, 2034

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01K1/143
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A low pressure temperature sensor for measuring the temperature of a substrate during semiconductor device manufacturing is generally described. Various embodiments describe a gas chamber having an opening disposed within a dielectric plate of a platen with a seal disposed around the opening in the gas chamber such that the opening in the gas chamber may be sealed against the substrate. Furthermore, a temperature sensor and a spring are disposed in the gas chamber, the spring biased to place the temperature sensor in contact with the substrate. Additionally, a gas source configured to pressurize the gas chamber with a low pressure gas in order to increase thermal conductivity between the substrate and the temperature sensor is provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.