Method and apparatus for model based flexible MRC
US9418194B2 · kind B2 · utility
2Cited by
8References
16Claims
0Family size
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Key dates
| Filing date | Aug 11, 2014 |
| Grant date | Aug 16, 2016 |
| Priority date | — |
| Expiry date | Aug 11, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/00
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Described herein is a method of processing a pattern layout for a lithographic process, the method comprising: identifying a feature from a plurality of features of the layout, the feature violating a pattern layout requirement; and reconfiguring the feature, wherein the reconfigured feature still violates the pattern layout requirement, the reconfiguring including evaluating a cost function that measures a lithographic metric affected by a change to the feature and a parameter characteristic of relaxation of the pattern layout requirement.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.