Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition
US9422513B2 · kind B2 · utility
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36References
14Claims
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Key dates
| Filing date | Dec 2, 2014 |
| Grant date | Aug 23, 2016 |
| Priority date | — |
| Expiry date | Dec 2, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A liquid removal composition and process for removing sacrificial anti-reflective coating (SARC) material from a substrate having same thereon. The liquid removal composition includes at least one fluoride-containing compound, at least one organic solvent, optionally water, and optionally at least one chelating agent. The composition achieves at least partial removal of SARC material in the manufacture of integrated circuitry with minimal etching of metal species on the substrate, such as aluminum, copper and cobalt alloys, and without damage to low-k dielectric materials employed in the semiconductor architecture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.