Process chamber gas flow apparatus, systems, and methods

US9429248B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Nir Merry · Mountain View, US
• Chandrakant M. Sapkale · Savanuru, IN
• Karuppasamy Muthukamtchi · Viralimalai, IN
• Jeffrey C. Hudgens · San Francisco, US
• Penchala N. Kankanala · Santa Clara, US

Key dates

• Filing date: Nov 26, 2013
• Grant date: Aug 30, 2016
• Expiry date: Aug 16, 2034

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T137/8593
• WIPO field: Mechanical elements
• WIPO sector: Mechanical engineering

Abstract

Process chamber gas flow control apparatus having a tiltable valve are disclosed. The gas flow apparatus includes a process chamber adapted to contain a substrate, an exit from the process chamber including a valve seat, and a tiltable valve configured and adapted to tilt relative to the valve seat to control flow non-uniformities within the process chamber. Systems and methods including the tiltable valve apparatus are disclosed, as are numerous other aspects.