Coating compositions for use with an overcoated photoresist
US9429844B2 · kind B2 · utility
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5References
7Claims
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Key dates
| Filing date | Feb 28, 2007 |
| Grant date | Aug 30, 2016 |
| Priority date | — |
| Expiry date | Mar 8, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2041
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred organic coating compositions of the invention comprise one or more resins that can harden upon thermal treatment without generation of a cleavage product. Particularly preferred organic coating compositions of the invention comprise one or more components that comprise anhydride and hydroxy moieties.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.