Patent · US Active

Method for determining the performance of a photolithographic mask

US9431212B2 · kind B2 · utility

0Cited by

1References

21Claims

0Family size

Assignee

Carl Zeiss SMS Ltd. · IL

Inventors

Markus Waiblinger · Dresden, DE
Michael Budach · Hanau, DE
Thomas Scherübl · Berlin, DE
Dirk Beyer · Palo Alto, US

Key dates

Filing date	Apr 29, 2011
Grant date	Aug 30, 2016
Priority date	—
Expiry date	Apr 29, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/24
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

The invention relates to a method for determining a performance of a photolithographic mask at an exposure wavelength with the steps of scanning at least one electron beam across at least one portion of the photolithographic mask, measuring signals generated by the at least one electron beam interacting with the at least one portion of the photolithographic mask, and determining the performance of the at least one portion of the photolithographic mask at the exposure wavelength based on the measured signals.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.