Patent · US Active

Method and apparatus for lithographic mask production

US9442369B1 · kind B1 · utility

0Cited by

0References

9Claims

0Family size

Assignee

KLA-TENCOR CORPORATION · US

Inventors

Dmitry Shur · Holon, IL
Joel Seligson · Kiryat Shmona, IL

Key dates

Filing date	Jul 24, 2013
Grant date	Sep 13, 2016
Priority date	—
Expiry date	Jan 9, 2034

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70283
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An electro-deposition apparatus deposits a first pattern of a lithographic mask. The electro-deposition apparatus then deposits a second pattern of the lithographic mask, at least partially offset from the first pattern. The resulting lithographic mask includes a first pattern having a minimum feature resolution size and maximum pitch, and a second pattern having the same minimum feature resolution size and maximum pitch. The first pattern and second pattern are at least partially offset such that a fractional portion of the second pattern is realized and light transmission is more precisely controlled.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.