Joel Seligson
26Patents
13h-index
42Co-inventors
81Inventor score
Filing activity: Jul 30, 1987 → May 8, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6172349A | Autofocusing apparatus and method for high resolution microscope system | Physics | 78 | Expired |
| US6928628B2 | Use of overlay diagnostics for enhanced automatic process control | Physics | 75 | Expired |
| US7440105B2 | Continuously varying offset mark and methods of determining overlay | Physics | 57 | Expired |
| US4805038A | Imaging apparatus which includes a light-valve array having electrostatically deflectable elements | Physics | 56 | Expired |
| US7608468B1 | Apparatus and methods for determining overlay and uses of same | Emerging Cross-Sectional Technologies | 41 | Expired |
| US8441639B2 | Metrology systems and methods | Physics | 32 | Active |
| US7528941B2 | Order selected overlay metrology | Physics | 29 | Active |
| US7876438B2 | Apparatus and methods for determining overlay and uses of same | Emerging Cross-Sectional Technologies | 21 | Active |
| US8896832B2 | Discrete polarization scatterometry | Physics | 15 | Active |
| US9080971B2 | Metrology systems and methods | Physics | 15 | Active |
| US7310789B2 | Use of overlay diagnostics for enhanced automatic process control | Physics | 14 | Active |
| US8681413B2 | Illumination control | Physics | 13 | Active |
| US8908175B1 | Flexible scatterometry metrology system and method | Physics | 13 | Active |
| US8873054B2 | Metrology systems and methods | Physics | 12 | Active |
| US7602491B2 | Optical gain approach for enhancement of overlay and alignment systems performance | Physics | 10 | Active |
| US9104120B2 | Structured illumination for contrast enhancement in overlay metrology | Physics | 8 | Active |
| US7724375B1 | Method and apparatus for increasing metrology or inspection tool throughput | Physics | 7 | Active |
| US4731670A | Imaging apparatus | Electricity | 7 | Expired |
| US7111256B2 | Use of overlay diagnostics for enhanced automatic process control | Physics | 5 | Expired |
| US8582114B2 | Overlay metrology by pupil phase analysis | Physics | 5 | Active |
| US9164397B2 | Optics symmetrization for metrology | Physics | 4 | Active |
| US10261014B2 | Near field metrology | Physics | 1 | Active |
| US9645079B2 | Structured illumination for contrast enhancement in overlay metrology | Physics | 1 | Active |
| US9442369B1 | Method and apparatus for lithographic mask production | Physics | 0 | Active |
| US10274425B2 | Structured illumination for contrast enhancement in overlay metrology | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.