Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern
US9442371B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 22, 2015 |
| Grant date | Sep 13, 2016 |
| Priority date | — |
| Expiry date | Jan 22, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0752
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of producing a structure containing a phase-separated structure, including a step in which a layer including an Si-containing block copolymer having a plurality of blocks bonded is formed between guide patterns on a substrate; a step in which a solution of a top coat material is applied to the layer and the guide patterns so as to form a top coat film; and a step in which the layer including the Si-containing block copolymer and having the top coat film formed thereon is subjected to annealing treatment so as to conduct a phase separation of the layer; in which a solvent of the solution of the top coat material contains no basic substance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.