Methods for retargeting circuit design layouts and for fabricating semiconductor devices using retargeted layouts
US9443055B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 29, 2015 |
| Grant date | Sep 13, 2016 |
| Priority date | — |
| Expiry date | Apr 29, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Methods for retargeting a circuit design layout for a multiple patterning lithography process and for fabricating a semiconductor device are provided. In an exemplary embodiment, a computer-executed method for retargeting a circuit design layout for a multiple patterning lithography process is provided. The method includes decomposing a circuit design layout file to produce decomposed layout files in a computer. Each decomposed layout file is associated with a respective mask for use in the multiple patterning lithography process. The method includes preparing retargeted layout files in the computer by retargeting selected decomposed layout files based on photolithography limitations specific to each selected decomposed layout file to produce retargeted layout files. Also, the method includes determining in the computer that a combination of layout files includes a spacing conflict. The method further includes resolving the spacing conflict in the computer by modifying the layout file or layout files causing the spacing conflict.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.