Determining a state of a high aspect ratio hole using measurement results from an electrostatic measurement device
US9448253B2 · kind B2 · utility
0Cited by
4References
17Claims
0Family size
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Key dates
| Filing date | May 21, 2015 |
| Grant date | Sep 20, 2016 |
| Priority date | — |
| Expiry date | May 21, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2815
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system, method and a non-transitory compute readable medium for evaluating a high aspect ratio (HAR) hole having a nanometric scale width and formed in a substrate, including obtaining, during an illumination period, multiple measurement results by an electrostatic measurement device that comprises a probe tip that is placed in proximity to the HAR hole; wherein multiple locations within the HAR hole are illuminated with a beam of charged particles during the illumination period; and processing the multiple measurement results to determine a state of the HAR hole.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.