Ceramic showerhead with embedded RF electrode for capacitively coupled plasma reactor
US9449795B2 · kind B2 · utility
377Cited by
30References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 8, 2013 |
| Grant date | Sep 20, 2016 |
| Priority date | — |
| Expiry date | Feb 24, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32091
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A showerhead assembly for a substrate processing system includes a back plate connected to a gas channel. A face plate is connected adjacent to a first surface of the back plate and includes a gas diffusion surface. An electrode is arranged in one of the back plate and the face plate and is connected to one or more conductors. A gas plenum is defined between the back plate and the face plate and is in fluid communication with the gas channel. The back plate and the face plate are made of a non-metallic material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.