Patent · US Active

Method and system for providing a target design displaying high sensitivity to scanner focus change

US9454072B2 · kind B2 · utility

8Cited by

4References

21Claims

0Family size

Assignee

KLA-TENCOR CORPORATION · US

Inventors

Vladimir Levinski · Milpitas, US
Yoel Feler · Haifa, IL
Daniel Kandel · Aseret, IL

Key dates

Filing date	Nov 7, 2013
Grant date	Sep 27, 2016
Priority date	—
Expiry date	Mar 23, 2034

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/70
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A segmented mask includes a set of cell structures, wherein each cell structure includes a set of features having an unresolvable segmentation pitch along a first direction, wherein the unresolvable segmentation pitch along the first direction is smaller than the illumination of the lithography printing tool, wherein the plurality of cell structures have a pitch along a second direction perpendicular to the first direction, wherein the unresolvable segmentation pitch is suitable for generating a printed pattern for shifting the best focus position of the lithography tool by a selected amount to achieve a selected level of focus sensitivity.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.