Inventor · Aseret, IL

Daniel Kandel

64Patents
13h-index
115Co-inventors
83Inventor score

Filing activity: Feb 16, 2005 → Sep 18, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US7440105B2 Continuously varying offset mark and methods of determining overlay Physics 57 Expired
US8441639B2 Metrology systems and methods Physics 32 Active
US7528941B2 Order selected overlay metrology Physics 29 Active
US7277172B2 Measuring overlay and profile asymmetry using symmetric and anti-symmetric scatterometry signals Physics 24 Expired
US9739702B2 Symmetric target design in scatterometry overlay metrology Physics 22 Active
US8214771B2 Scatterometry metrology target design optimization Electricity 19 Active
US9678421B2 Target element types for process parameter metrology Electricity 19 Active
US9093458B2 Device correlated metrology (DCM) for OVL with embedded SEM structure overlay targets Electricity 17 Active
US9080971B2 Metrology systems and methods Physics 15 Active
US8896832B2 Discrete polarization scatterometry Physics 15 Active
US8142966B2 Substrate matrix to decouple tool and process effects Emerging Cross-Sectional Technologies 14 Active
US8908175B1 Flexible scatterometry metrology system and method Physics 13 Active
US10228320B1 Achieving a small pattern placement error in metrology targets Physics 13 Active
US7616313B2 Apparatus and methods for detecting overlay errors using scatterometry Physics 12 Active
US9581430B2 Phase characterization of targets Physics 12 Active
US8873054B2 Metrology systems and methods Physics 12 Active
US7602491B2 Optical gain approach for enhancement of overlay and alignment systems performance Physics 10 Active
US10203247B2 Systems for providing illumination in optical metrology Electricity 9 Active
US9864209B2 Self-moire target design principles for measuring unresolved device-like pitches Physics 9 Active
US8913237B2 Device-like scatterometry overlay targets Electricity 8 Active
US9104120B2 Structured illumination for contrast enhancement in overlay metrology Physics 8 Active
US9454072B2 Method and system for providing a target design displaying high sensitivity to scanner focus change Physics 8 Active
US9958385B2 Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology Physics 8 Active
US9927718B2 Multi-layer overlay metrology target and complimentary overlay metrology measurement systems Physics 7 Active
US8582114B2 Overlay metrology by pupil phase analysis Physics 5 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.