Ashing device
US9466475B2 · kind B2 · utility
0Cited by
14References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 26, 2014 |
| Grant date | Oct 11, 2016 |
| Priority date | — |
| Expiry date | Jan 28, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/31138
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ashing device that prevents the ashing rate from changing over time. The ashing device ashes organic material on a substrate including an exposed metal in a processing chamber. The ashing device includes a path, which is formed in the processing chamber and through which active species supplied to the processing chamber pass. The path is defined by a surface on which the metal scattered from the substrate by the active species is collectible, with the surface being formed so as to expose a metal that is of the same kind.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.