Photoresist compositions and methods of forming photolithographic patterns
US9482948B2 · kind B2 · utility
0Cited by
7References
11Claims
0Family size
Assignee
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Key dates
| Filing date | Oct 22, 2015 |
| Grant date | Nov 1, 2016 |
| Priority date | — |
| Expiry date | Oct 22, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F220/283
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided are photoresist compositions useful in forming photolithographic patterns by a negative tone development process. Also provided are methods of forming photolithographic patterns by a negative tone development process and substrates coated with the photoresist compositions. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.