Pellicle for reticle and multilayer mirror
US9482960B2 · kind B2 · utility
11Cited by
13References
13Claims
0Family size
Assignee
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Key dates
| Filing date | Feb 14, 2014 |
| Grant date | Nov 1, 2016 |
| Priority date | — |
| Expiry date | Aug 24, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/061
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.