Pattern classification based proximity corrections for reticle fabrication
US9500945B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 9, 2015 |
| Grant date | Nov 22, 2016 |
| Priority date | — |
| Expiry date | Jun 9, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/30
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Pattern classification based proximity corrections for reticle fabrication are provided. A digital layout of a circuit design and proximity compensation data generated based on measurements of formed reticle elements are obtained. The proximity compensation data includes proximity correction values to correct for proximity effects of a reticle-formation process to form a reticle for use in fabricating a circuit of the circuit design. Based on a pattern classification of one or more patterns in the digital layout of the circuit design, at least one proximity correction is applied to the digital layout of the circuit design to facilitate correcting for proximity effects of the reticle-formation process, the at least one proximity correction being determined based on one or more of the proximity correction values of the obtained proximity compensation data. Additional adjustments to the digital layout are also provided according to aspects described herein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.