Illumination system of a microlithographic projection exposure apparatus

US9500954B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Markus Deguenther · Aalen, DE
• Vladimir Davydenko · Bad Herrenalb, DE
• Thomas Korb · Schwäbisch Gmünd, DE
• Frank Schlesener · Oberkochen, DE
• Stefanie Hilt · Aalen, DE
• Wolfgang Hoegele · Rosenheim, DE

Key dates

• Filing date: Nov 17, 2014
• Grant date: Nov 22, 2016
• Expiry date: Nov 17, 2034

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70425
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An illumination system of a microlithographic projection exposure apparatus includes an optical integrator having a plurality of light entrance facets each being associated with a secondary light source. A spatial light modulator has a light exit surface and transmit or to reflect impinging projection light in a spatially resolved manner. A pupil forming unit directs projection light on the spatial light modulator. An objective images the light exit surface of the spatial light modulator onto the light entrance facets of the optical integrator. The light exit surface of the optical light modulator includes groups of object areas being separated by areas that are not imaged on the light entrance facets. The objective combines images of the object areas so that the images of the object areas abut on the optical integrator.