Modification of magnetic properties of films using ion and neutral beam implantation
US9508375B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 13, 2010 |
| Grant date | Nov 29, 2016 |
| Priority date | — |
| Expiry date | Jun 18, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31711
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Methods and apparatus for forming substrates having magnetically patterned surfaces is provided. A magnetic layer comprising one or more materials having magnetic properties is formed on the substrate. The magnetic layer is subjected to a patterning process in which selected portions of the surface of the magnetic layer are altered such that the altered portions have different magnetic properties from the non-altered portions without changing the topography of the substrate. A protective layer and a lubricant layer are deposited over the patterned magnetic layer. The patterning is accomplished through a number of alternative processes that expose substrates to energy of varying forms.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.