Illumination optical assembly, exposure apparatus, and device manufacturing method
US9513560B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 24, 2014 |
| Grant date | Dec 6, 2016 |
| Priority date | — |
| Expiry date | Sep 14, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70566
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An illumination optical system can form a pupil intensity distribution with a desired beam profile. The illumination optical system for illuminating an illumination target surface with light from a light source is provided with a spatial light modulator which has a plurality of optical elements arrayed on a predetermined surface and individually controlled and which variably forms a light intensity distribution on an illumination pupil of the illumination optical system; a divergence angle providing member which is arranged in a conjugate space including a surface optically conjugate with the predetermined surface and which provides a divergence angle to an incident beam and emits the beam; and a polarizing member which is arranged at a position in the vicinity of the predetermined surface or in the conjugate space and which changes a polarization state of a partial beam of a propagating beam propagating in an optical path.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.