Patent · US Active

Lithographic apparatus

US9513566B2 · kind B2 · utility

5Cited by
4References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 28, 2013
Grant dateDec 6, 2016
Priority date—
Expiry dateFeb 28, 2033

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/70933
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A lithographic apparatus injects gas between a reticle (MA) and reticle blades (REB-X, REB-Y) to protect the reticle from contamination. The gas may be injected either into the space defined between the reticle and the closest pair of reticle blades, or into the space defined between the two pairs of reticle blades.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.