Variable radius mirror dichroic beam splitter module for extreme ultraviolet source
US9516729B2 · kind B2 · utility
2Cited by
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20Claims
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Key dates
| Filing date | Jul 21, 2015 |
| Grant date | Dec 6, 2016 |
| Priority date | — |
| Expiry date | Jul 21, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0088
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A laser produced plasma extreme ultraviolet laser source comprising at least one variable radius mirror. The at least one variable radius mirror to adjust a beam diameter of a main pulse at a specified distance from a pre-pulse focal plane, where the pre-pulse radiates droplets into target droplets and the main pulse radiates the target droplets into a plasma state to generate the extreme ultraviolet radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.