Metrology for measurement of photosensitizer concentration within photo-sensitized chemically-amplified resist (PS-CAR)
US9519227B2 · kind B2 · utility
10Cited by
2References
20Claims
0Family size
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Key dates
| Filing date | Feb 23, 2015 |
| Grant date | Dec 13, 2016 |
| Priority date | — |
| Expiry date | Sep 2, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70675
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods for measuring photosensitizer concentrations in a photo-sensitized chemically-amplified resist (PS-CAR) patterning process are described. Measured photosensitizer concentrations can be used in feedback and feedforward control of the patterning process and subsequent processing steps. Also described is a metrology target formed using PS-CAR resist, and a substrate including a plurality of such metrology targets to facilitate patterning process control.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.