Electrical inspection of electronic devices using electron-beam induced plasma probes
US9523714B2 · kind B2 · utility
2Cited by
26References
45Claims
0Family size
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Key dates
| Filing date | Jan 15, 2014 |
| Grant date | Dec 20, 2016 |
| Priority date | — |
| Expiry date | Nov 27, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/164
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A non-mechanical contact signal measurement apparatus includes a first conductor on a structure under test and a gas in contact with the first conductor. At least one electron beam is directed into the gas so as to induce a plasma in the gas where the electron beam passes through the gas. A second conductor is in electrical contact with the plasma. A signal source is coupled to an electrical measurement device through the first conductor, the plasma, and the second conductor when the plasma is directed on the first conductor. The electrical measurement device is responsive to the signal source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.