Susceptor support shaft with uniformity tuning lenses for EPI process
US9532401B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 14, 2014 |
| Grant date | Dec 27, 2016 |
| Priority date | — |
| Expiry date | Jan 10, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05B2203/032
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Embodiments of the invention generally relate to susceptor support shafts and process chambers containing the same. A susceptor support shaft supports a susceptor thereon, which in turn, supports a substrate during processing. The susceptor support shaft reduces variations in temperature measurement of the susceptor and/or substrate by providing a consistent path for a pyrometer focal beam directed towards the susceptor and/or substrate, even when the susceptor support shaft is rotated. The susceptor support shafts also have a relatively low thermal mass which increases the ramp up and ramp down rates of a process chamber. In some embodiments, a custom made refractive element can be removably placed on the top of the solid disc to redistribute secondary heat distributions across the susceptor and/or substrate for optimum thickness uniformity of epitaxy process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.