Optical system for a microlithographic projection exposure apparatus

US9535331B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Michael Patra · Oberkochen, DE
• Johannes Eisenmenger · Ulm, DE
• Markus Schwab · Aalen, DE

Key dates

• Filing date: Jul 21, 2014
• Grant date: Jan 3, 2017
• Expiry date: Jan 23, 2035

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70116
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An optical system for a microlithographic projection exposure apparatus has an optical axis, at least one mirror arrangement having a plurality of mirror elements that are adjustable independently of one another for altering an angular distribution of the light reflected by the mirror arrangement, and a deflection device which includes, relative to the optical beam path downstream of the mirror arrangement, at least one deflection surface at which a deflection of the optical axis occurs. The at least one deflection surface has refractive power.