Method and device for splitting a high-power light beam to provide simultaneous sub-beams to photolithography scanners
US9541839B2 · kind B2 · utility
3Cited by
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20Claims
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Key dates
| Filing date | Mar 4, 2015 |
| Grant date | Jan 10, 2017 |
| Priority date | — |
| Expiry date | Aug 5, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/065
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods for receiving a high-energy EUV beam and distributing EUV sub-beams to photolithography scanners and the resulting device are disclosed. Embodiments include receiving a high-energy primary EUV beam at a primary splitting optical assembly; splitting the primary EUV beam into primary EUV sub-beams; reflecting the primary EUV sub-beams to beam-splitting optical arrays; splitting the primary EUV sub-beams into secondary EUV sub-beams; reflecting the secondary EUV sub-beams to EUV distribution optical arrays; and distributing simultaneously the secondary EUV sub-beams to scanners.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.