System and method for generation of extreme ultraviolet light
US9544984B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 18, 2014 |
| Grant date | Jan 10, 2017 |
| Priority date | — |
| Expiry date | Jul 18, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E30/10
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.