Patent · US Active

Method of removing waste of substrate and waste removing device thereof

US9545691B2 · kind B2 · utility

0Cited by
7References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 23, 2013
Grant dateJan 17, 2017
Priority date
Expiry dateDec 29, 2034

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC03B33/0222
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

According to an exemplary embodiment of the disclosure, a method of removing a waste part of a substrate is provided. The method includes: using a laser to partially drill the substrate to define the waste part; and applying megasonic vibration to the substrate to remove the waste part from the substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.