Surface inspection apparatus and method thereof
US9551670B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Apr 10, 2014 |
| Grant date | Jan 24, 2017 |
| Priority date | — |
| Expiry date | Feb 14, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8854
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A defect inspection apparatus including: a first illumination optical system which is configured to illuminate the inspection area on a sample surface from a normal line direction or a direction near thereof with respect to said sample surface; a second illumination optical system which is configured to illuminate said inspection area from a slant direction with respect to said sample surface; a detection optical system having a plurality of first detectors which are located, in front of, on the sides of, and behind said inspection area, respectively, with respect to the illumination direction of said second illumination optical system, and where the regular reflected light component, from said sample surface, by illumination light of said second illumination optical system, is not converged; and a signal processing system which is configured to inspect a defect, upon basis of signals obtained from said plurality of first detectors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.