Vapor deposition systems and methods
US9556519B2 · kind B2 · utility
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41References
20Claims
0Family size
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Key dates
| Filing date | Nov 27, 2011 |
| Grant date | Jan 31, 2017 |
| Priority date | — |
| Expiry date | Aug 11, 2032 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2258/0216
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Vapor deposition systems and methods associated with the same are provided. The systems may be designed to include features that can promote high quality deposition; simplify manufacture, modification and use; as well as, reduce the footprint of the system, amongst other advantages.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.