Lithographic apparatus and device manufacturing method
US9563137B2 · kind B2 · utility
1Cited by
6References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 20, 2010 |
| Grant date | Feb 7, 2017 |
| Priority date | — |
| Expiry date | Oct 16, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02046
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A lithographic projection apparatus includes a laser cleaning device. The laser cleaning device is constructed and arranged to clean a surface. The laser cleaning device includes a laser source constructed and arranged to generate radiation, and an optical element constructed and arranged to focus the radiation in a focal point in order to generate a cleaning plasma in a background gas above the surface. The laser cleaning device is further provided with a gas supply constructed and arranged to generate a jet of protection gas at a location near the plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.