Method for high-velocity and atmospheric-pressure atomic layer deposition with substrate and coating head separation distance in the millimeter range
US9567670B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 29, 2014 |
| Grant date | Feb 14, 2017 |
| Priority date | — |
| Expiry date | Dec 29, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/545
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An ALD coating method to provide a coating surface on a substrate is provided. The ALD coating method comprises: providing a deposition heading including a unit cell having a first precursor nozzle assembly and a second precursor nozzle assembly; emitting a first precursor from the first precursor nozzle assembly into chamber under atmospheric conditions in a direction substantially normal to the coating surface; emitting a second precursor from the first precursor nozzle assembly into chamber under atmospheric conditions in a direction substantially normal to the coating surface; removing moving the substrate under the deposition head such that the first precursor is directed onto a first area of the coating surface prior to the second precursor being directed onto the first area of the coating surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.