Patent · US Active

Extreme ultraviolet reflective element with multilayer stack and method of manufacturing thereof

US9581890B2 · kind B2 · utility

3Cited by

15References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Ralf Hofmann · Heidenheim, DE
Vinayak Vishwanath Hassan · San Francisco, US
Cara Beasley · Scotts Valley, US
Majeed A. Foad · Sunnyvale, US

Key dates

Filing date	Apr 24, 2015
Grant date	Feb 28, 2017
Priority date	—
Expiry date	Jul 13, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3429
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An apparatus and method of manufacture of an extreme ultraviolet reflective element includes: a substrate; a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer formed from silicon and a second reflective layer formed from niobium or niobium carbide for forming a Bragg reflector; and a capping layer on and over the multilayer stack for protecting the multilayer stack by reducing oxidation and mechanical erosion.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.