High voltage isolation of an inductively coupled plasma ion source with a liquid that is not actively pumped
US9591735B2 · kind B2 · utility
3Cited by
63References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 21, 2012 |
| Grant date | Mar 7, 2017 |
| Priority date | — |
| Expiry date | Nov 8, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/4652
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An inductively-coupled plasma source for a focused charged particle beam system includes a plasma chamber and a fluid that is not actively pumped surrounding the plasma chamber for providing high voltage isolation between the plasma chamber and nearby parts which are at ground potential, such as a conductive shield. One or more cooling devices cool the plasma chamber by using evaporative cooling and heat pipes to dissipate the heat from the plasma chamber into a surrounding environment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.