Lithographic apparatus and contamination removal or prevention method
US9599908B2 · kind B2 · utility
2Cited by
19References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 9, 2015 |
| Grant date | Mar 21, 2017 |
| Priority date | — |
| Expiry date | Oct 9, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70925
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.