Selecting one or more parameters for inspection of a wafer
US9601393B2 · kind B2 · utility
11Cited by
5References
69Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 5, 2010 |
| Grant date | Mar 21, 2017 |
| Priority date | — |
| Expiry date | Aug 14, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Computer-implemented methods, computer-readable media, and systems for selecting one or more parameters for inspection of a wafer are provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.